Tantalum pentachloride (TaCl₅)

Description

1. Product Overview
Tantalum pentachloride (TaCl₅) is a high-purity anhydrous metal halide essential for the production of tantalum metals, carbides, and advanced coating precursors. Its primary industrial use lies in chemical vapor deposition (CVD) for semiconductor barrier layers and as an intermediate in extracting ultra-high-purity tantalum for capacitors and superalloys. The key value proposition is its exceptional purity consistency, enabling defect-free thin films and reliable metallurgical performance. Strategically, TaCl₅ is critical for supply chains in aerospace, defense, and electronics, where tantalum’s corrosion resistance and electrical reliability are irreplaceable.

2. Key Specifications & Technical Characteristics

• Chemical composition: Tantalum pentachloride (TaCl₅), ≥99.99% trace metals basis

• Purity level: 4N (99.99%) min., with custom 5N (99.999%) available upon request

• Physical characteristics: Pale yellow to white crystalline powder; melting point 216–218°C; boiling point 242°C (sublimes); density 3.68 g/cm³ at 25°C; particle size 10–50 µm (standard), fine-grade <10 µm available

• Packaging options: Hermetically sealed 1 kg, 5 kg, and 25 kg stainless steel drums under inert argon; bulk 200 kg UN-certified composite drums

• Shelf life: 12 months from date of manufacture when stored below 30°C in dry, inert conditions (≤1% RH)

3. Core Industrial Applications

• Semiconductors & electronics: Precursor for CVD of tantalum nitride (TaN) diffusion barriers in logic and memory chips — outperforms PVD alternatives with superior step coverage and fewer voids at <10 nm nodes.

• Aerospace superalloys: Intermediate for tantalum-doped nickel-based superalloys (e.g., CMSX-4) — delivers higher creep resistance at 1,100°C compared to columbium or tungsten alternatives.

• Chemical processing equipment: Raw material for tantalum coatings on reactors and heat exchangers — TaCl₅-derived coatings achieve 2× the acid corrosion resistance (HCl/H₂SO₄ up to 250°C) of zirconium or titanium.

• Powder metallurgy: Reduction to high-surface-area tantalum powder for medical implants and capacitors — yields 15% higher capacitance per gram vs. conventional sodium reduction routes.

4. Competitive Advantages

• Quality consistency: In-line FTIR and ICP-MS per batch; lot-to-lot variation <0.002% for critical impurities (Fe, Cr, Ni, W) — documented via certificate of analysis.

• Supply reliability: Dedicated production line with 50 MT/month capacity; buffer stock held in three regional hubs (North America, EU, Asia) ensuring 7-day lead time for contract customers.

• Logistics capability: UN 3260 (corrosive solid, acidic, inorganic, n.o.s.) hazardous certified packaging; global door-to-door with real-time tracking.

• Price competitiveness: Fixed quarterly pricing for 12+ month contracts; volume discounts starting 1 MT.

• Sustainability: 98% chlorine recovery loop in manufacturing; available with third-party audited carbon footprint data per product kg.

• Technical support: Free application lab support for CVD parameter optimization; MSDS and handling SOPs included.

5. Commercial & Supply Information

• Minimum Order Quantity (MOQ): 20 kg for standard 4N grade; 5 kg for 5N grade

• BULK loading capacity: 20 MT per 20-ft container (UN-certified drums, 200 kg each, stacked 5 high on pallets)

• Lead time: 14 days for MOQ; 30 days for bulk 20 MT; expedited 7 days available at 10% premium

• Incoterms: EXW (Shanghai / Houston / Rotterdam), FOB, CIF, DDP — buyer’s choice

• Payment terms: Letter of credit (LC at sight) or net 30 days for approved corporate accounts with credit check