Description
1. Product Overview
The Wafer Edge Ring (Silicon Carbide Edge Ring) is a precision-engineered consumable component designed exclusively for plasma etching chambers in semiconductor fabrication. Its primary industrial use is to extend the uniform plasma boundary across the wafer edge, thereby improving etch rate uniformity and reducing edge-exclusion zones. The key value proposition lies in its superior resistance to halogen-based plasma corrosion, thermal stability, and mechanical rigidity—directly translating to lower defect densities and longer mean time between replacements. As semiconductor nodes shrink below 5nm and wafer diameters move to 300mm and beyond, the SiC edge ring is strategically critical for achieving >99.9% die yield per wafer.
2. Key Specifications & Technical Characteristics
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Chemical Composition: High-purity α-phase Silicon Carbide (SiC), >99.95% purity; binder-free, chemically vapor deposited (CVD) or sintered
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Purity Level: Metal impurities < 10 ppm (Fe, Cr, Ni, Na, K, Ca); surface particle contamination < 0.1 particles/cm² (≥0.2 µm size)
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Physical Characteristics: Matte black or dark gray; annular ring geometry with laser-marked orientation notch; density 3.15–3.21 g/cm³; Vickers hardness 2400–2800 HV; flexural strength ≥ 380 MPa; surface roughness Ra ≤ 0.4 µm
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Thermal & Electrical Properties: Max service temperature 1,400°C in plasma; thermal conductivity 120–150 W/m·K; volume resistivity 10³–10⁵ Ω·cm (tailored for RF coupling)
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Packaging Options: Class 10 cleanroom single-wafer shippers (vacuum-sealed anti-static bags) or multi-ring HDPE carriers with ESD foam inserts
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Shelf Life: Unlimited under dry, non-corrosive storage; factory-calibrated flatness guaranteed for 24 months from ship date
3. Core Industrial Applications
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Primary Industries: Advanced logic (foundry), 3D NAND flash, DRAM, and power device fabs (SiC, GaN on 200/300mm lines)
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Specific Use Cases: Oxide etch, polysilicon etch, metal hard mask open, and deep silicon etch (Bosch process) in chambers such as Lam Research Kiyo, TEL Vigus, and Applied Materials Centris.
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Performance vs. Alternatives: Outperforms quartz or silicon edge rings by exhibiting >3× longer lifetime (up to 15,000 RF hours) under aggressive fluorocarbon/chlorine chemistries. Unlike graphite or alumina, SiC does not shed particles or react with NF₃/O₂ plasmas, reducing defect adders by 40–60% as validated in 300mm production data.
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Efficiency & Cost Advantage: Enables tighter edge die yield (gains of 2–5 additional die per wafer), reduces chamber wet-clean frequency by 30%, and lowers cost-of-ownership per wafer start by 18–22% versus quartz rings.
4. Competitive Advantages
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Quality Consistency: 100% laser interferometry flatness inspection (< 50 µm TIR); SEM/EDS verified for trace metals; each ring serialized with full traceability to CVD run.
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Supply Reliability: Dual-source production (Japan and Germany) with 12-week standard lead time; safety stock maintained in regional hubs (US, Taiwan, Korea, China).
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Logistics Capability: Real-time shipment tracking via API integration with customer ERP; expedited 5-day airfreight available for critical fab-down scenarios.
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Price Competitiveness: Tiered pricing for annual blanket orders (3%–8% below market average for equivalent CVD-SiC grade); no royalty or tool-specific licensing fees.
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Sustainability: 100% recyclable scrap material; manufacturing powered by hydroelectric energy; waste SiC powder reclaimed for abrasive industries.
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Technical Support: Full datasheet, installation torque specifications, chamber-matching guide, and 24/6 application engineering support; optional on-site flatness verification kit provided.
5. Commercial & Supply Information
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Minimum Order Quantity (MOQ): 20 pieces (mixed diameters allowed)
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Bulk 20MT Loading Capacity: One standard 20FT container = 450 units (based on 300mm rings, packed in shippers, palletized) → 22.5 MT max net weight (exceeds 20MT limit; practical bulk order = 400 units/18 MT per 20FT)
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Loading Capacity per 20FT Container: 18 MT net (400 rings) for safe weight distribution and UN packaging compliance








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