Sulfuric Acid (H2SO4 EL GRADE)

Description

1. Product Overview

Sulfuric Acid (H2SO4 EL Grade) is a high-purity, electronic-grade mineral acid engineered for mission-critical semiconductor, photovoltaic, and precision chemical manufacturing processes. Its primary industrial use is as a cleaning, etching, and doping agent in wafer fabrication and high-purity reagent production. The key value proposition is its exceptionally low trace metal content (parts-per-trillion level), which eliminates contamination risks in yield-sensitive electronics production. Strategically, this product is indispensable to the global digital and green energy supply chains, where purity directly drives device performance and manufacturing profitability.

2. Key Specifications & Technical Characteristics

• Chemical Composition: H2SO4, balance deionized water

• Purity Level: Electronic Grade (EL Grade) – 96% ±1% w/w; Trace metals (each) ≤ 10 ppb; Total anions (Cl, NO3, PO4) ≤ 50 ppb; Particles (≥0.5 µm) ≤ 100 per mL

• Physical Characteristics: Colorless, odorless, oily liquid; Density ~1.84 g/cm³ at 20°C; Viscosity 21–25 cP; Non-volatile residue ≤ 5 ppm

• Packaging Options: 30 kg HDPE jerricans, 330 kg IBC totes, ISO tank containers (20–24 MT), fluorinated drum liners

• Shelf Life: 24 months from manufacture when stored in sealed, chemically resistant containers at 15–30°C, away from organics and moisture

3. Core Industrial Applications

• Primary Industries: Semiconductor fabs (front-end-of-line), solar PV cell manufacturing, flat panel displays, specialty electronic chemicals, analytical laboratories

• Operational Use Cases: RCA cleaning (SC-1/SC-2 steps) of silicon wafers; etching of oxide layers; metal impurity removal from silicon substrates; pH adjustment in high-purity electroplating baths

• Performance Advantages vs. Alternatives: Technical-grade or AR-grade acids introduce metal ions (Fe, Cu, Ni) that cause device leakage and yield loss. EL Grade ensures >99.999% uptime in wet benches, reduces rework rates by up to 40%, and extends bath life by 30% versus standard reagent grades. The cost advantage lies in defect reduction—directly lowering scrap costs by $12–$18 per wafer.

4. Competitive Advantages

• Quality Consistency: ISO 9001:2025 + IATF 16949 certified; each batch undergoes ICP-MS trace metal analysis and particle count reporting with certificate of analysis (CoA) lot-traceable to raw material source.

• Supply Reliability: Dual-sourced production from sulfur-burning and metallurgical off-gas routes with dedicated EL-grade purification trains; buffer stock held in three regional hubs (Asia, EU, NA).

• Logistics Capability: 24/7 temperature-monitored tanker fleet; fluorinated packaging prevents container degradation; expedited air-freight for lab-pack quantities (≤330 kg IBC) available.

• Price Competitiveness: Direct mill pricing with volume-based tiered discounts (≥200 MT/mo); no premium for ISO tank delivery over standard acid.

• Sustainability: 98% post-use acid recovery and on-site neutralization service available in key markets; zero liquid discharge compatible.

• Technical Support: Dedicated semiconductor process engineers for integration into existing wet benches; full SDS, impurity speciation data, and compatibility matrices included.

5. Commercial & Supply Information

• Minimum Order Quantity (MOQ): BULK 20 MT (one ISO tank or flexitank equivalent)

• Loading Capacity: 24 MT per standard 20-ft ISO tank container (max net weight; tare ~3.5 MT); 20 MT per 20-ft general-purpose container with IBCs (12 x 330 gal units)