Ceramic Heater (AlN HEATER 300mm)

£7,000.00

The Ceramic Heater (AlN Heater 300mm) is a high-performance aluminum nitride-based thermal solution engineered for precision temperature control in advanced semiconductor and wafer processing environments. Designed for 300mm wafer platforms, it delivers uniform heat distribution, rapid thermal response, and exceptional electrical insulation under demanding process conditions. Its robust ceramic structure ensures long operational life in high-vacuum and corrosive process chambers.

Competitive Advantage Spotlight:
Combines superior thermal conductivity with excellent dielectric strength, enabling tighter process control, reduced thermal drift, and higher yield consistency in next-generation semiconductor manufacturing.

Description

1. Product Overview
The Ceramic Heater (AlN HEATER 300mm) is a high-performance aluminum nitride (AlN)-based thermal processing component engineered for advanced semiconductor and precision manufacturing environments. It is primarily used in wafer processing equipment, including deposition, etching, and thermal treatment systems where ultra-stable temperature control is critical. The product delivers exceptional thermal conductivity, electrical insulation, and mechanical stability under extreme operating conditions. Its strategic importance lies in enabling next-generation semiconductor fabrication with higher yield, improved process stability, and reduced thermal variation across 300mm wafer platforms.

2. Key Specifications & Technical Characteristics

Material Composition: High-purity Aluminum Nitride (AlN) ceramic
Purity Grade: Semiconductor-grade, ≥ 99% AlN equivalent purity
Wafer Compatibility: 300mm wafer process systems
Thermal Conductivity: High thermal conductivity ceramic (optimized for uniform heat distribution)
Electrical Properties: Excellent dielectric strength and electrical insulation
Physical Characteristics: Dense ceramic body, precision-machined flat heating surface
Surface Finish: Fine-polished for uniform thermal contact
Packaging Options: Cleanroom-grade vacuum-sealed protective packaging; shock-resistant export crates
Shelf Life: Indefinite under dry, controlled storage conditions

3. Core Industrial Applications

Semiconductor manufacturing: Wafer deposition, etching, annealing, and thermal oxidation processes
Flat panel display production: Precision thermal control in TFT-LCD and OLED manufacturing
Advanced electronics fabrication: High-reliability thermal processing for microelectronics
Vacuum and plasma systems: Stable heating element for high-vacuum process chambers

This AlN heater outperforms conventional ceramic heaters through superior thermal conductivity, ensuring faster temperature response, minimal thermal gradient, and improved process uniformity—critical for high-yield semiconductor production.

4. Competitive Advantages

Exceptional thermal uniformity enabling higher wafer process yield
Superior material stability under high-temperature and vacuum conditions
Reliable supply chain designed for continuous industrial-scale procurement
Cost-efficient lifecycle performance through reduced downtime and longer service life
Environmentally stable material with low contamination risk in cleanroom environments
Comprehensive technical documentation and engineering support for integration into OEM systems

5. Commercial & Supply Information

Minimum Order Quantity (MOQ): BULK 20 MT
Loading Capacity: Up to 20 MT per 20FT container (depending on packaging configuration)
Supply Form: Industrial bulk shipment or custom OEM supply contracts available
Logistics: International export-ready with standardized handling for fragile ceramic components

Additional information

Price	per MT

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