CMP Polishing Pad (IC1000)

£33,000.00

The IC1000 CMP Polishing Pad delivers defect-free, planarized wafer surfaces for advanced semiconductor nodes, combining high removal rate stability with extended pad life. Engineered for 300mm and 200mm fabs, its optimized groove geometry and polyurethane formulation ensure consistent oxide, tungsten, and copper CMP performance.

Competitive Advantage Spotlight
Superior within-wafer non-uniformity (WIWNU <3%) and 30% longer conditioning cycle life than industry benchmarks, reducing consumable costs and tool downtime.

Description

1. Product Overview
The CMP Polishing Pad (IC1000) is a precision-engineered polyurethane pad designed for chemical mechanical planarization in semiconductor and advanced substrate manufacturing. It delivers exceptional defect-free planarization for oxide, STI, and metal CMP processes, directly enabling yield improvement at advanced nodes. Its calibrated grooved architecture and stable mechanical properties reduce within-wafer non-uniformity (WIWNU) by up to 18% compared to standard pads. As fabs push toward 3nm and beyond, the IC1000 is a strategic consumable for maintaining die-to-die uniformity and lowering cost-per-wafer.

2. Key Specifications & Technical Characteristics

  • Composition: High-density microporous polyurethane foam, cross-linked, grooved or spiral pattern options

  • Purity: Trace metal analysis < 1 ppb (Cu, Fe, Ni) – SEMI S2/S8 compliant

  • Physical: Thickness 2.00–2.54 mm ±0.05 mm; Shore D hardness 52–58; porosity 25–35%; compressibility < 1.5% at 7 psi

  • Packaging: Class 100 cleanroom-sealed, single-wrapped or twin-stack trays (10 pads/case)

  • Shelf Life: 24 months from date of manufacture under < 40°C / < 60% RH

3. Core Industrial Applications

  • Primary industries: Semiconductor foundries, IDMs, memory fabs (DRAM, 3D NAND), advanced substrate packaging

  • Use cases: Oxide CMP (ILD, IMD), STI CMP, tungsten (W) and copper (Cu) bulk/barrier CMP

  • Performance advantage: Consistent removal rate stability (> 500 wafers/pad) with 30% lower defectivity (LPD counts) than open-cell alternatives

  • Cost advantage: Reduced pad conditioning frequency extends pad life by ~15%, directly lowering consumables cost per wafer edge

4. Competitive Advantages

  • Quality consistency: Inline Fourier-transform infrared (FTIR) and modulus testing on every batch – Cpk > 1.33 for all critical parameters

  • Supply reliability: Dual-site manufacturing (Asia, Europe) with 12-week rolling forecast commitment and buffer stock of 15k pads

  • Logistics capability: Ambient nitrogen-purged shipments with RFID-trackable pallets; 98% on-time delivery rate over 12 quarters

  • Price & sustainability: Tier-1 performance at 8–12% below comparable Dow IC1000 legacy SKUs; pad reclamation program for used material (30% reduced landfill)

5. Commercial & Supply Information

  • Minimum Order Quantity (MOQ): BULK 20 MT (approx. 28,000 pads based on 0.7 kg/pad)

  • Loading capacity per container: 20 MT per 40-ft HC container (palletized, 22 pallets, each ~900–1,000 kg net)

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