Arsine and phosphorus trifluoride (semiconductor grade)

Description

1. Product Overview

This semiconductor-grade Arsine (AsH₃) and Phosphorus Trifluoride (PF₃) offering is a high-purity, specialized gas mixture designed for critical ion implantation and chemical vapor deposition (CVD) processes in advanced semiconductor fabrication. Its primary industrial use is as a dopant source and etching agent in the production of compound semiconductors, LEDs, and high-frequency power devices. The key value proposition lies in sub-ppb level impurity control, ensuring superior wafer yield and device reliability. Strategically, securing a reliable supply of these niche hydride and fluoride gases is essential for fabs transitioning to 5nm and below nodes, as well as for gallium nitride (GaN) and indium phosphide (InP) substrate manufacturing.

2. Key Specifications & Technical Characteristics

• Chemical Composition: Arsine (AsH₃) ≥ 99.9995% / Phosphorus Trifluoride (PF₃) ≥ 99.997%

• Purity Grade: Semiconductor grade (SGS-certified), compliant with SEMI C3.30 and C3.60 standards

• Trace Impurities (max):

  • Oxygen (O₂): < 0.5 ppmv

  • Moisture (H₂O): < 0.5 ppmv

  • Carbon dioxide (CO₂): < 0.5 ppmv

  • Carbon monoxide (CO): < 0.5 ppmv

  • Non-volatile residues: < 10 ppbw

• Physical Form: Colorless, pyrophoric, toxic compressed liquefied gas

• Cylinder Type: Stainless steel (316L) or nickel-plated cylinders with Dip Tube (DOT 3AA / 3AL)

• Valve Outlet: CGA 660 / DISS 632 (for arsine); CGA 670 / DISS 720 (for PF₃)

• Packaging Options:

  • 44L / 47L cylinders (net weight: 5–15 kg gas)

  • ISO-frame tube trailers (bulk, up to 400 kg)

• Shelf Life: 24 months from date of analysis (when stored ≤ 30°C in original sealed cylinder)

3. Core Industrial Applications

• Primary Industries: Semiconductor foundries, compound semiconductor fabs (GaAs, InP, GaN), LED epitaxy, photovoltaic cell manufacturing (III-V multijunction solar cells), and MEMS production.

• Specific Operational Use Cases:

  • Ion Implantation (Arsine): n-type doping of silicon for logic and memory chips.

  • CVD / MOCVD (Phosphorus Trifluoride): Phosphorus source for InGaP barrier layers and GaP window layers in red/orange LEDs.

  • Etching (PF₃): Selective etching of silicon nitride over silicon oxide.

• Performance Advantages vs. Alternatives:

  • Compared to arsine/phosphine blends: PF₃ offers lower decomposition temperature (≈300°C vs >600°C) and higher vapor pressure, enabling faster deposition rates.

  • Lower defect density (≤0.03 defects/cm²) vs. standard purity grades, reducing scrap rates by an estimated 12–18% in high-volume fabs.

  • Eliminates particle-induced short circuits in power devices due to sub-10 ppb metal content (Fe, Cr, Ni, Cu).

4. Competitive Advantages

• Quality Consistency: Every batch is verified by gas chromatography–mass spectrometry (GC-MS) and atmospheric pressure ionization mass spectrometry (API-MS) with certificate of analysis (CoA) traceable to NIST standards.

• Supply Reliability: Multi-source raw material strategy + two independent filling facilities (Asia and North America) ensuring <0.5% annual supply disruption risk.

• Logistics Capability: Real-time cylinder tracking with IoT-enabled pressure telemetry; dedicated hazmat-certified last-mile delivery to fab gas yards.

• Price Competitiveness: Volume-based tiered pricing (10–20% below incumbent suppliers for annual contracts >500 kg).

• Sustainability & Safety: Returnable cylinder program (99% recapture rate), zero-venting filling process, and full compliance with Responsible Care® and CDP reporting.

• Technical Support: 24/7 applications engineering, on-site gas system design audits, and emergency response guarantee (<4 hours for major metro fab clusters).

5. Commercial & Supply Information

• Minimum Order Quantity (MOQ): 1 cylinder (44L) for qualification samples; 10 cylinders for production orders

• BULK 20MT Loading Capacity: Not applicable for compressed gas cylinders. For bulk liquid / tube trailer:

  • ISO Tube Trailer capacity: 20 MT equivalent (approximately 12,000 Nm³ of gaseous AsH₃ or 9,500 Nm³ of PF₃) – Note: Actual 20MT load is feasible only for PF₃ (MW 88); AsH₃ is typically shipped in <500 kg batches due to toxicity constraints.

• MT per Container (standard 20FT ISO container):

  • Arsine: 44L cylinders → 80 cylinders per 20FT = approx. 1.2 MT (gas weight)

  • Phosphorus Trifluoride: 44L cylinders → 80 cylinders per 20FT = approx. 2.8 MT (gas weight)

• Lead Time: 4 weeks ARO for stock grades; 8 weeks for custom blend or isotope-specified grades

• Incoterms: EXW (filling plant), FCA (port of loading), or DDP (fab-receiving dock) – buyer selects